Photo-modulated reflectance measurements provide a powerful, non-contact, non-destructive and inline-compatible method with low-cost operation for statistical process control of ion implantation steps on monitor and on product wafers. We present case studies describing how photo-modulated reflectivity measurements (PMR) can be used for ion implantation dose, fluence and tilt angle monitoring with excellent resolution, even for low-energy ion implantation processes. This is important because precise dopant and damage profile control is crucial in state-of-the art semiconductor processes utilizing shallow junctions and complex 3D doping profiles.
