1997
Materials Science Forum, 248-249, 101-103

Charge Carrier Lifetime Modification in Silicon by High Energy H+, He+ Ion Implantation

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Abstract

MeV H+ or He+ was implanted into CZ-Si to set carrier lifetime with the aim of customisation of power devices. Commercial Microwave Photoconductice Decay (µ-PCD, Semilab, Inc.) equipment was intended to use for wafer characterization. Realistic evaluation of µ-PCD data required a model to handle cases when the probing carrier pocket does not match the desired defect distribution. Parameters of this multilayer model were extracted from vacancy distribution using the TRIM code.

Topic

Charge Carrier Lifetime, Excess Charge Pocket, Ion Implantation, Lifetime Tailoring, Microwave Photoconductive Decay (μ-PCD), Radiation Damage, Recombination Activity

Author

N.Q. Khanh, P. Tüttő, E.N. Jaroli, O. Buiu, L.P. Bíró, F. Pászti, T. Mohácsy, Cs. Kovacsics, A. Manuaba, J. Gyulai

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